Cobalt Plate Sputtering Target for Magnetron Coating

Type: Metal Target
Shape: Plate
Certification: TUV, ISO, CE
Purity: 99.9%-99.95%
Material: Cobalt
Size: Customized

Products Details

Basic Info.

Model NO.
XK-Co
Application
Glass/Metal/Plastic/Ceramic Coating
MOQ
1 PC
Free Sample
Accept
Packing
Wooden Case
Certificate
Provide for Each Target
Transport
by Express
Delivery
5-10 Days
Transport Package
Wooden Case
Specification
any size
Trademark
no
Origin
China
HS Code
8486909900
Production Capacity
1000 PCS/Year

Product Description

Cobalt/Co sputtering target features:

Chemical Composition: pure cobalt

Available Purity: 3N-3N5

Production Technology: EB melting

Shapes: planar targets, rotary targets

Average Grain Size: < 100um  

Vanadium Sputtering Target is produced by melting technology. Because vanadium oxide has very special optical and electric properties, it can be applied for Infrared intelligent window, electro-optic switch device, and as laser protection materials and stealth material. With up to 3N purity and special annealing treatment, uniform grain size, lower gas content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.

Cobalt Plate Sputtering Target for Magnetron CoatingCobalt Plate Sputtering Target for Magnetron Coating

COMPANY PROFILE:

Since 2014

Specializing in high purity sputtering targets.

Leader manufacturer of sputtering materials in China.

Qualified the world certificates such as ISO9001:2008 and SGS.

Comprehensive in R&D, manufacturing, and sales on thin film materials.

Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.

Cobalt Plate Sputtering Target for Magnetron CoatingCobalt Plate Sputtering Target for Magnetron Coating

OUR PRODUCTS     

*Metal Target : W, Mo, Ta, Nb, Cu, V, Ni, Ti, Fe, Al ,Zr, Co, Au, Ag, Pt, etc.

*Alloy Target : NiFe, NiCr, NiV, CuNi,TiAl, CoCr, CoFe, WTi, CoTaZr,CuInGa, ZnSn, CuZn, etc

*Ceramic Target : TiO2,Al2O3,Ta2O5, ZrO2,SiC,SiO,SiO2, ITO, GZO, AZO, WS2, MoS2,Ga2O3,HfO2,etc

*Evaporation Materials : Crucible, Pellets,Granules,Pieces,etc

*Backing Plate: Cu, Mo, SS,etc

*Bonding Service: Indium, Elastomer       
 Cobalt Plate Sputtering Target for Magnetron Coating   Cobalt Plate Sputtering Target for Magnetron Coating                                  
 OUR ADVANTAGE


1,Many years manufacturing & exporting experience.

2 Strict & complete QC systerm

3,Perfect after sale systerm                                                   
Cobalt Plate Sputtering Target for Magnetron Coating
 
PACKING & DELIVERY
 
Packaging Detail:
Inside: drying agent and vacuum sealed to prevent oxidization
Outside: wooden case to avoid damage during transportation

 
Delivery Detail: Within 3-15 working days .
DHL, FedEx, UPS door to door service, 5-7 days from China to your country.
 
Cobalt Plate Sputtering Target for Magnetron Coating
OUR CERTIFICATE

Cobalt Plate Sputtering Target for Magnetron Coating


 

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