99.95% Purity Cr Chromium Sputtering Target Metal Chromium Target for PVD Film Coating

Warranty: Within 30 Days After Shipment
Condition: New
Certification: ISO9001
Customized: Customized
Material: Pure Chromium
Application: Metallurgy,Semiconductor,Evaporation

Products Details

  • Overview
  • Product Description
  • Company Information
  • FAQ
Overview

Basic Info.

Model NO.
XK-Cr 01
CAS No
7440-47-3
Usage
PVD Film Coating
Shape
Plate,Circle,Pellets
Delivery Time
7-21days
Keywords
Metal Chromium Metallurgy
Size
D50.8X3mm or as Request
Purity
99.9-99.95%
Chemical Composition
Cr
Appearance
Polished Surface
MOQ
1PCS
Product Name
Metal Chromium Target
Package
Vacuum Blister
Transport Package
Vacuum Sealed Package Inside
Trademark
XinKang
Origin
Hunan, China
Production Capacity
1000000 Piece/Pieces Per Month

Product Description

Product Description

 

XinKang Hot Sale Metal Chromium Target 99.95% Purity Cr Chromium Sputtering Target for PVD Film Coating for Evaporation Experiments

99.95% Purity Cr Chromium Sputtering Target Metal Chromium Target for PVD Film Coating

Name Metal Chromium Targets
Purity 99.9%-99.95%
Size D50.8x3mm,2inch,3inch, As request
Symbol Cr
Density 7.19g/cm³
Melting Point 1857
Shape Planar target, Rotary target.Pellets, Piece,
MOQ 1PCS
Application Experiments materials,Evaporation materials, PVD Film Coating and etc

99.95% Purity Cr Chromium Sputtering Target Metal Chromium Target for PVD Film Coating

 

 

The microstructure can be adjusted by our flexibility production process, to achieve your desired effect. If the grains of the sputtering target are uniformly aligned, the user can benefit from constant erosion rates and homogeneous layers. The pictures below are two micrographs of our chromium sputtering target, the average grain size<100μm.

Our chromium sputtering target is high purity, the most important benefit is that the films will possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process. Following is a typically Certificate of analysis for 3N5 chromium sputtering target.

Analytical Methods:
1. Metallic elements were analyzed by GDMS and ICP-OES.
2. Gas elements were analyzed by LECO.99.95% Purity Cr Chromium Sputtering Target Metal Chromium Target for PVD Film Coating

Application: Chromium Sputtering Targets

99.95% Purity Cr Chromium Sputtering Target Metal Chromium Target for PVD Film Coating

Other Related Sputtering Targets

Metal Target  Ni,Al,Cu,V,Co,W,Mo,Ta,Nb,Cr,Ti,Zr,Hf,Mg,Fe,Zn,Pb,Sn,Bi,Ga,Ge,In,Si,C,B,Te and rare earth targets
Alloy Target Ni,Fe,Co,Cu,Al alloy. and special alloy 
Evaporation Materials Ni,Al,Cu,V,Co,W,Mo,Ta,Nb,Cr,Ti,Zr,Hf,Mg,Fe,Zn,Pb,Sn,Bi,Ga,Ge,In,Si,C,B,Te and etc
Ceramic Targets Oxide Ceramic, Compound ceramic targets.
   
Company Information

 99.95% Purity Cr Chromium Sputtering Target Metal Chromium Target for PVD Film Coating

99.95% Purity Cr Chromium Sputtering Target Metal Chromium Target for PVD Film Coating

99.95% Purity Cr Chromium Sputtering Target Metal Chromium Target for PVD Film Coating

FAQ

 

1. Are you trading company or manufacturer ?
Xinkang: We are a professional manufacturer specialized in this field for over 10 years.

 

2: How long is your delivery time?
Xinkang: Shipment can be made in 5-7 days for those regular size, or samples , and 15-20 days for batch quantity. 
 
3: Do you have MOQ ? 
Xinkang: No, we support samples.

 

4: What is your payment method?
Xinkang: T/T in advance, Paypal , Western Union and etc.

 

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